Oxford Instruments offers flexible, configurable process tools and leading-edge processes for the precise, controllable and repeatable etching, deposition and growth of micro- and nano-structures.
Our systems provide process solutions for the micro- and nanometre engineering of materials for semiconductor, optoelectronics, HBLED, PV, MEMS & microfluidics, high quality optical coatings and many other applications in micro- and nanotechnology.
These solutions are based on core technologies in:
- Plasma Etch & Deposition
- Atomic Layer Deposition (ALD)
- Ion Beam Etch & Deposition
- Deep Silicon Etch Systems
- Magnetron sputtering
